ShinEtsu MicroSi, Inc.

D2D

Leadership in research, development and manufacture of materials for the semiconductor industry.

Lithography
 

Barrier Coat (BC) Materials


Applications



For use with Shin-Etsu MicroSi Contrast Enhancement Materials (CEM) Barrier coats are thin transparent polymer films spin coated directly over the photoresist surface after softbake. Shin-Etsu MicroSi offers the following barrier coat products to be used in conjunction with Shin-Etsu MicroSi Contrast Enhancement Material (CEM) products


Other Applications



The thin transparent film can be used as a barrier between two photoresist layers to minimize interaction between the two resist layers. Shin-Etsu MicroSi Barrier Coat products are used in the disc mastering production industry for the production for CD ‘s and DVD’s.


Contrast Enhancement Materials Guideline



Barrier Coat (BC) Thickness@4000 rpm CEM product
BC-5.0 950 ± Å 365WSHR, 388WS, 388PG, 420WS, 420WSF
BC-7.5 4500 ± Å 388SS, 420SS

Other Applications



Barrier Coat (BC) Thickness@4000 rpm Application
BC-5.3 1350 ± Å Disc mastering


Deep UV Photoresists
I-line; G-line; Broadband DNQ Resists
Chemically Amplified I-line Application
Photo-imageable Dielectric Materials
Contrast Enhancement Materials
Barrier Coats
Adhesion Promoters

480.893.8898


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Phoenix, AZ 85044