Pellicles
Drawing upon the technological expertise we developed in the design and manufacture of various electronic materials, Shin-Etsu offers extremely high quality pellicles for photomask protection.
Recently Shin-Etsu has developed polymer coated frames for the ion control and A2 membrane for the immersion ArF lithography. Shin-Etsu MicroSi offers three general pellicle grades; they are designed for KRF, dry ARF and immersion ARF excimer laser lithography.
- Extremely low particle specification limits
- Increased usage life
- Increased photomask and reticle life
Product Designations
Product Numbering Example:
|
6N2HF-EXN
|
 |
| 1. Mask Size |
6: for 6 inch mask |
| 2. Scanner type |
A: ASML, N: Nikon (&Canon) |
| 3. Frame type |
(from 1,2,3...9, A,B,C...) |
4. Pellicle
Stand-off |
H: Normal stand-off, L: Lower stand-off |
| 5. Frame Option |
F: Anodized & filter attached, N: Anodized & no filter, B: Polymer coated & filter attached] |
| 6. Wavelength |
EX: KrF, AX: ArF, AK: ArF/KrF dual, A2: Immersion ArF |
| 7. Grade / adhesive option |
N: Normal arch silicone adhesive, E: Low tack flat silicone adhesive,
B: Arch acrylic adhesive J: Flat acrylic adhesive |
