Quartz Substrates
Shin-Etsu produces quartz substrates that demonstrate excellent permeability and low thermal expansibility in the far-ultraviolet range. Shin-Etsu substrates are most commonly used as photomask substrates for optical lithography and other applications that require ultra-high purity and high precision polishing.
FEATURES
Ultra-high purity synthetic quarts substrates Surface defects:
IC Applications
SZS Grade ≤1µm
SMS Grade ≤2µm
LCD Applications
SMS Grade ≤2µm
PRODUCTS
Synthetic quartz photomask substrates for:
IC; g line, I line, KrF (248nm) lithography; ArF (193 nm) lithography; F2 (157nm) lithography.
Synthetic quartz photomask substrates for:
LCD; TFT; Color Filters