|
|
|
|
|
|
Optimized for photoresist thickness less than approximately 5.0µm and critical dimensions as low as 0.40µm with a NA= 0.48 stepper. Can be used with positive or negative photoresist systems. Water based solvent system.
|
|
|
CEM-365iS
90KB |
|
|
|
|
|
Specifications:
|
|
|
| Solids |
14 ± 1% |
| Viscosity @ 25 Deg C |
5.4 ± 0.5 cstks |
| Refractive index |
1.55 |
| Film thickness |
3,900 ± 200 Å @ 4,000 rpm |
| Appearance |
Clear, Yellow |
| Initial transmission (365 nm) |
< 6.5 |
| Final transmission (365 nm) |
> 83.5 |
|
|
|
|
|
|
Figure 1
|
|
|
|
|
|
|
|
|
