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CEM-365WSHR |
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Optimized for photoresist thickness less than approximately 0.60µm and critical dimensions as low as 0.25µm with a NA= 0.60 stepper. Optimized for 365 nm (i-line) applications where CD’s less than approximately 0.5um are being used and for broadband applications where the photoresist thickness of less than approximately 5.0um is being used. Can be used with positive or negative photoresist systems. Butanol and ethyl benzene solvent system.
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Specifications:
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| Solids |
7.5 ± 1.0% |
| Viscosity @ 25 Deg C |
2.5 ± 0.5 cstks |
| Refractive index |
1.62 |
| Film thickness |
2,000 ± 250Å @ 4,000 rpm |
| Appearance |
Clear, Yellow |
| Initial transmission (405 nm) |
< 5.5 % |
| Final transmission (405 nm) |
> 85% |
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Figure 1
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97KB
