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CEM-388PG 98KB
CEM-388PG

Optimized for photoresist thickness less than approximately 6.0µm. Broadband response ideal for g-h-I exposure systems (e.g., Suss MicroTec). Can be used with positive or negative photoresist systems. Propylene glycol methyl ether acetate (PGMEA) solvent system.

CEM-388PG Data Sheet 98KB

Specifications:
Solids 18.5 ± 2.0 %
Viscosity @ 25 Deg C 7.5 ± 0.5 cstks
Refractive index 1.58
Film thickness  6,100Å ± 400Å @ 4,000 rpm
Appearance  Clear, Yellow
Initial transmission (365 nm)  < 2%
Final transmission (365 nm)  > 90%
Figure 1