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CEM-388SS |
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Optimized for photoresist thickness from approximately 7.0µm to over 100µm. Can be used with positive or negative photoresist systems and BCB. Broadband response ideal for g-h-I exposure systems (e.g., Suss MicroTec). Propylene glycol methyl ether acetate (PGMEA) solvent system.
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CEM-388SS
Data Sheet 
98KB
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Specifications:
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| Solids |
25 ± 2.0 % |
| Viscosity @ 25 Deg C |
17.5 ± 1.5 cstks |
| Refractive index |
1.57 |
| Film thickness |
1.70 µm ± 0.15µm @ 2,000 rpm |
| Appearance |
Clear, Yellow |
| Initial transmission (405 nm) |
< 2% |
| Final transmission (405 nm) |
> 90% |
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Figure 1
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