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CEM-420SS |
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Optimized for photoresist thickness from approximately 7.0µm to over 100µm. Can be used with positive or negative photoresist systems and BCB. Broadband response ideal for g-h-I or g-h exposure systems (e.g., Ultratech). Propylene glycol methyl ether acetate (PGMEA) solvent system.
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CEM-420SS Data Sheet
98KB
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Specifications:
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| Solids |
27.0 ± 2.0% |
| Viscosity @ 25 Deg C |
20.0 ± 2.0 cstks |
| Refractive index |
1.56 |
| Film thickness |
1.65 µm ± 0.15µm @ 4,000 rpm |
| Appearance |
Clear, Yellow |
| Initial transmission (436 nm) |
< 4% |
| Final transmission (436 nm) |
> 90% |
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Figure 1
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