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CEM-420WS |
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Optimized for photoresist thickness less than approximately 6.0µm. Broadband response ideal for g-h-I or g-h exposure systems (e.g., Ultratech). Can be used with positive or negative photoresist systems. Butanol and ethyl benzene solvent system.
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CEM-420WS
97KB |
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Specifications:
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| Solids |
16.0 ± 2.0% |
| Viscosity @ 25 Deg C |
7.0 ± 0.5 cstks |
| Refractive index |
1.54 |
| Film thickness |
6,600 ± 400Å @ 4,000 rpm |
| Appearance |
Clear, Red |
| Initial transmission (436 nm) |
< 4% |
| Final transmission (436 nm) |
> 90% |
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Figure 1
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