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Photosensitive organic polymer namely photoresist is widely used in many applications within various industries such as Semiconductor IC manufacturing, Thin Film Head, Opto-elecronics, Telecommunications, Fiber Optics, GaAs, MEMS and Biomedical engineering. Photoresist chemically reacts at certain Ultraviolet wavelength of light to form images on Silicon wafers or different media. In the ongoing highly accelerated world of technology and continuous shrinkage of device architecture, the demand for sophisticated Photoresists related to lithography has grown tremendously. Shin-Etsu Chemical is the only company that has developed a fully integrated manufacturing process for KrF photoresist. Our production capabilities and product quality has allowed Shin-Etsu to become the world leader, in terms of market share, of KrF photoresist. Based on image size and critical dimension requirements, there are several photoresists readily available for I-line, G-line, Broad band, 248nm and 193nm wavelengths.
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