Home > Products > Photolithography > Photolithography Chemicals > I-line; G-line; Broadband Negative Application
Photolithography Chemicals PHOTOLITHOGRAPHY PRODUCTS
Photolithography Chemicals
Contrast Enhancement Materials
Barrier Coats
Adhesion Promoters
Photodefinable Materials for Advanced Packaging 616KB
3D packaging, WLP, TSV and wafer bonding

For stress buffer, wafer bonding, copper pillar, RDL and 3D packaging. Low modulus, low temperature cure, low stress; g, h, or i-line sensitive, thick plating resists and dry films. Low dielectric constant; safe solvent; excellent prime-less adhesion.

Photodefinable Materials for Advanced Packaging 616KB