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Mask Blanks PHOTOMASKS
Quartz Substrates & Wafers
Pellicles
Mask Blanks
     
   
 
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Shin-Etsu was the first company in the world to develop a way to mass produce synthetic quartz, and is currently the world's largest synthetic quartz producer. Shin-Etsu has also developed proprietary production techniques for high-quality products such as optical isolators, fiber optic couplers, lithium tantalate, PBN and fine ceramics. 

As the lithographic features continue to shrink the semiconductor industry is presented with a significant challenge to obtain defect free mask blanks. Because of its purity and light transmission accuracy, synthetic quartz is the ideal photomask material.

The Shin-Etsu group established the technology to synthesize ultra high purity quartz by burning gaseous silicon compounds instead of starting from natural quartz. Through this method we are able to reduce impurities levels below 1 ppb. The purity and transparency of quartz glass makes it superior for light transmission. In common sheet glass, light can travel only about two meters before it is diffused by impurities. Quartz glass, however, can transport light up to 100 km without any detectable diffusion. 

To obtain information about Shin-Etsu MicroSi’s quartz substrates please contact us at: info@microsi.com or (888) 642.7674.