|
|
|
|
|
|
High Quality Pellicles for Photomask Protection
|
|
|
| Drawing upon the technological expertise we developed in the design and manufacture of various electronic materials, Shin-Etsu has developed extremely high quality pellicles for photomask protection. Shin-Etsu MicroSi offers three general pellicle grades; they are designed for
KRF, ARF excimer laser lithography and KRF/ARF dual wavelength. All three use the same materials and manufacturing technology to provide: |
|
|
|
| |
- Extremely low particle specification limits
- Increased usage life
- Increased photomask and reticle life
|
|
|
Product Designations |
|
|
|
|
|
Product Numbering Example:
|
6N2HF-EXN |
 |
|
|
|
|
|
|
| 1. Mask Size |
[6: 6”, 5: 5”] |
| 2. Stepper |
[N: Nikon, C: Canon, A: ASM, S: SVG] |
| 3. Frame Number |
|
| 4. Pellicle Mount |
[H: Pattern side, L: Glass side] |
| 5. Ventilation |
[F: Vent filter attached, N: None] |
| 6. Wavelength |
[EX: KrF excimer, AX: ArF excimer, AK: ArF/KrF dual] |
| 7. Grade |
|
|
|
|
|
|
|
| Part No. |
KrF |
ArF |
Dual |
Dimension (mm) |
Shape |
Angle |
|
Outer size |
Inner size |
Height |
|
| PL5N1LF |
EXN |
AXN |
AKN |
98 x 120 |
94.1 x 116.1 |
4.0 |
Rectangle |
|
| PL6A1HF |
EXN |
AXN |
AKN |
118 x 147 |
114 x 143 |
5.0 |
Octagon |
35° |
| PL6A2HF |
EXN |
AXN |
AKN |
113 x 149 |
109 x 145 |
5.0 |
Rectangle |
|
| PL6A3HF |
EXN |
AXN |
AKN |
120 x 147 |
116 x 143 |
5.0 |
Octagon |
30° |
| PL6A4HF |
EXN |
AXN |
AKN |
109 x 147 |
105 x143 |
5.0 |
Octagon |
35° |
| PL6A5HF |
EXN |
AXN |
AKN |
113 x 147 |
109 x 143 |
5.0 |
Octagon |
30° |
| PL6C1HF |
EXN |
AXN |
AKN |
124 x 150 |
102.1 x 146.1 |
6.3 |
Rectangle |
|
| PL6N1HN |
EXN |
AXN |
AKN |
118 x 149 |
114.1 x 145.1 |
6.3 |
Rectangle |
|
| PL6N1HF |
EXN |
AXN |
AKN |
118 x 149 |
114.1 x 145.1 |
6.3 |
Rectangle |
|
| PL6N2HF |
EXN |
AXN |
AKN |
122 x 149 |
118.1 x 145.1 |
6.3 |
Rectangle |
|
| PL6S1HF |
EXN |
AXN |
AKN |
104.8 x 148.2 |
100.9 x 144.3 |
5.0 |
Rectangle |
|
|
|
|
|
|
|
|
Back To Top ^
|
|
|
