Quartz Substrates & Wafers

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	Quartz Substrates & Wafers Pellicles Mask Blanks


	Synthetic Quartz Glass Substrates 324KB
	Synthetic Quartz Glass Substrates for Nano-Imprint Templates 773KB
	ArF Substrates catalogue 5,694KB

Quartz Substrates & Wafers

Shin-Etsu produces quartz substrates that demonstrate excellent permeability and low thermal expansibility in the far-ultraviolet range. Shin-Etsu substrates are most commonly used as photomask substrates for optical lithography and other applications that require ultra-high purity and high precision polishing.

FEATURES

Ultra-high purity synthetic quarts substrates
Surface defects:
IC Applications
SZS Grade ≤1µm
SMS Grade ≤2µm
LCD Applications
SMS Grade ≤2µm

PRODUCTS

Synthetic quartz photomask substrates for:
IC; g line, I line, KrF (248nm) lithography; ArF (193 nm) lithography; F2 (157nm) lithography.

Synthetic quartz photomask substrates for:
LCD; TFT; Color Filters

Nano-Imprint Templates

A growing number of companies are focusing on the development of devices using nano-imprint technologies. These devices include semiconductors, storage devices, optical parts, biochips and various MEMS devices.
Shin-Etsu has developed a new line of synthetic quartz substrates for nano-imprint templates based upon our cutting edge production technologies.

FEATURES

High transmissivity to deep UV
UV-resistance
Low Thermal Expansion
High heat resistance
Dimensional accuracy
Flatness specifications are in sub-micron ranges
No defects and low surface roughness averages.

PRODUCTS

Please review the attached data sheet for sizes, shapes and other options.

Synthetic Quartz Wafers

Shin-Etsu wafers have excellent thermal resistance and light transmission properties. The primary application for these wafers is for use in high temperature poly-Si TFT-LCD applications along with other applications that require high purity, high precision polishing.

FEATURES

Ultra high purity synthetic quartz wafers
Compared to ordinary glass, Shin-Etsu’s synthetic quartz possesses a low thermal expansion and extremely high permeability over the entire wavelength range from ultraviolet to infrared region.


	GRADES

	VIOSIL-SQ: Is produced from the same material as our high-purity synthetic quartz photomask substrate. VIOSIL-SX: Improved material which has been modified to provide better heat resistance for high temperature applications (1,000°C).

PRODUCTS

	External diameters from 3”Ø (76.2mm) to a maximum of 12” Ø (300mm).