An extensive line of thermal interface materials; molding compounds, LED encapsulents and underfills, including 2.5D and 3D photodefinable material
The latest high-quality and high-performance KrF photoresists, ArF photoresists, F2 photoresists, spin-on hardmasks, and other lithography materials.
Photomasks & pellicles
Synthetic photomask quartz substrates used for integrated circuits, and attenuated phase-shift masks for use in Arf and Krf photoresists.
High-purity, high-precision and high-performance PBN ceramic material products for the ever expanding high-tech industry.
Functional vinyl resins consisting of various base chemicals, including vinyl chloride copolymer, vinyl acetate, and acrylic acid ester.
Quartz Wafers & Substrates
Our VIOSIL Synthetic Quartz products have many advantages and are used for photomask blank substrates, micro lens substrates, Nano imprint and DNA templates.
Optical isolators are devices that allow the transmission of laser beams emitted from a laser diode to travel in only one direction.
Our silicone based materials were developed for MEMS mounted sensors, smaller package devices and high performance integrated devices.
Other products by Shin-Etsu MicoSi.