An extensive line of thermal interface materials; molding compounds, LED encapsulents and underfills, including 2.5D and 3D photodefinable material
The latest high-quality and high-performance KrF photoresists, ArF photoresists, F2 photoresists, spin-on hardmasks, and other lithography materials.
Photomasks & pellicles
Synthetic photomask quartz substrates used for integrated circuits, and attenuated phase-shift masks for use in Arf and Krf photoresists.
High-purity, high-precision and high-performance PBN ceramic material products for the ever expanding high-tech industry.
Functional vinyl resins consisting of various base chemicals, including vinyl chloride copolymer, vinyl acetate, and acrylic acid ester.
Quartz Wafers & Substrates
For these wafers is for use in high temperature poly-Si TFT-LCD applications along with other applications that require high purity, high precision polishing.