Photomask & Pellicles

Shin-Etsu MicroSi is a top-ranking manufacturer of synthetic photomask quartz substrates used for integrated circuits, synthetic, large photomask quartz substrates used for LCD, and attenuated phase-shift masks for use in Arf and Krf photoresists. For over twenty years, we have offered a stable supply of top quality quartz substrates. Synthetic quartz wafers are now available in sizes up to 300mm diameters meeting a wide range of requirements form our customers.

MicroSi’s photolithography division also specializes in producing a variety of OMOG (Opaque MoSi On Glass) photomask blanks made from advanced Molybdenum-Silicon Binary material which provides superior light-shielding protection, along with attenuated phase-shift masks used in the resist process necessary for creating ArF, KrF, and F2 photoresists.


Drawing upon the technological expertise we developed in the design and manufacture of various electronic materials, Shin-Etsu offers extremely high quality pellicles for pellicle photomask protection.

Mask Blanks

Photomask blanks are the base material of photomasks that are used as the patterning templates of circuit during the semiconductor lithography process. The light-shielding layer is formed on the surface of mask blank whose substrate is synthetic quartz.

COVID-19 Statement:
At this time, Shin-Etsu MicroSi, Inc. is open and running as normal. We are continuing to monitor the situation closely and follow the guidance of public health officials, CDC, WHO, and local and U.S. Governments, to quickly move to take the appropriate precautions. We may adjust our normal operating procedures to support social distancing guidelines. We will continue to keep you informed of any developments.