Mask Blanks

mask_picPhotomask blanks are the base material of photomasks that are used as the patterning templates of circuit during the semiconductor lithography process. The light-shielding layer is formed on the surface of mask blank whose substrate is synthetic quartz.

Instead of Chromium (Cr) used for conventional light-shielding layer of photomask blanks, Shin-Etsu has developed the new manufacturing processes to use cutting-edge Molybdenum-Silicon Binary (OMOG: Opaque MoSi on Glass) for a light-shielding, mask blank layer. Shin-Etsu has established the mass-production technology of such most advanced photomask blanks with its superior etching characteristics. Shin-Etsu’s mask blank highly evaluated by device makers as an essential material for cutting-edge semiconductor manufacturing processes.

In addition, Shin-Etsu supplies attenuated phase-shift photomask blanks for ArF and KrF, which respond to customers’ needs.


  • We use our own quartz substrates for the mask blanks that are high quality material refined in the synthetic quartz field.
  • Our chemical amplified resist coated on the mask blanks is also developed by our own outstanding technology for semiconductor photoresists.
  • We supply diversification of product lines that combines our own quartz substrates, our own chemical amplified resists, and state of the art layer forming technology.

To obtain information about Shin-Etsu MicroSi’s quartz substrates please contact us at: or (888) 642.7674.

COVID-19 Statement:
At this time, Shin-Etsu MicroSi, Inc. is open and running as normal. We are continuing to monitor the situation closely and follow the guidance of public health officials, CDC, WHO, and local and U.S. Governments, to quickly move to take the appropriate precautions. We may adjust our normal operating procedures to support social distancing guidelines. We will continue to keep you informed of any developments.