peliclesDrawing upon the technological expertise we developed in the design and manufacture of various electronic materials, Shin-Etsu offers extremely high quality pellicles for pellicle photomask protection.

Recently Shin-Etsu has developed a pellicle material in polymer coated frames for the ion control and A2 membrane for the immersion ArF lithography. Shin-Etsu MicroSi offers three general pellicle material grades; they are designed for KRF, dry ARF and immersion ARF excimer laser lithography. These pellicles offer the following advantages:

  • Extremely low particle specification limits
  • Increased usage life
  • Increased pellicle photomask and reticle life

Product Designations:

Product Numbering Example:


1. Mask Size 6: for 6 inch mask
2. Scanner type A: ASML, N: Nikon (&Canon)
3. Frame type  (from 1,2,3…9, A,B,C…)
4. Pellicle
H: Normal stand-off, L: Lower stand-off
5. Frame Option F: Anodized & filter attached, N: Anodized & no filter, B: Polymer coated & filter attached]
6. Wavelength EX: KrF, AX: ArF, AK: ArF/KrF dual, A2: Immersion ArF
7. Grade / adhesive option N: Normal arch silicone adhesive, E: Low tack flat silicone adhesive,
B: Arch acrylic adhesive J: Flat acrylic adhesive





COVID-19 Statement:
At this time, Shin-Etsu MicroSi, Inc. is open and running as normal. We are continuing to monitor the situation closely and follow the guidance of public health officials, CDC, WHO, and local and U.S. Governments, to quickly move to take the appropriate precautions. We may adjust our normal operating procedures to support social distancing guidelines. We will continue to keep you informed of any developments.