Drawing upon the extensive, electronic, lithography material expertise developed from our chemical manufacturing field, Shin-Etsu offers the latest high-quality and high-performance KrF photoresists, ArF photoresists, F2 photoresists, spin-on hardmasks, and other lithography materials related to the semiconductor production process. Our line of lithography material products employ a variety of methods in semiconductor applications connected to the resist process. Whether it’s ArF photoresists, spin-on hardmasks, thin resist films, or lithographic etching, MicroSi can deliver quality lithography material that competes with other similar products in the industry.
- Deep UV Photoresists
- I-line; G-line; NOVOLAK, and Chemically Amplified Resists
- Advanced Packaging Materials
- Contrast Enhancement Materials
- Barrier Coats
- Adhesion Promoters