Drawing upon the extensive, electronic, lithography material expertise developed from our chemical manufacturing field, Shin-Etsu offers the latest high-quality and high-performance KrF photoresists, ArF photoresists, F2 photoresists, spin-on hardmasks, and other lithography materials related to the semiconductor production process. Our line of lithography material products employ a variety of methods in semiconductor applications connected to the resist process. Whether it’s ArF photoresists, spin-on hardmasks, thin resist films, or lithographic etching, MicroSi can deliver quality lithography material that competes with other similar products in the industry.



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