Pellicles

pelicles
Drawing upon the technological expertise we developed in the design and manufacture of various electronic materials, Shin-Etsu offers extremely high quality pellicles for pellicle photomask protection.

Recently Shin-Etsu has developed a pellicle material in polymer coated frames for the ion control and A2 membrane for the immersion ArF lithography. Shin-Etsu MicroSi offers three general pellicle material grades; they are designed for KRF, dry ARF and immersion ARF excimer laser lithography. These pellicles offer the following advantages:

 

  • Extremely low particle specification limits
  • Increased usage life
  • Increased pellicle photomask and reticle life

 

Product Designations

Product Numbering Example:

product_num

1. Mask Size 6: for 6 inch mask
2. Scanner type A: ASML, N: Nikon (&Canon)
3. Frame type  (from 1,2,3…9, A,B,C…)
4. Pellicle
Stand-off
H: Normal stand-off, L: Lower stand-off
5. Frame Option F: Anodized & filter attached, N: Anodized & no filter, B: Polymer coated & filter attached]
6. Wavelength EX: KrF, AX: ArF, AK: ArF/KrF dual, A2: Immersion ArF
7. Grade / adhesive option N: Normal arch silicone adhesive, E: Low tack flat silicone adhesive,
B: Arch acrylic adhesive J: Flat acrylic adhesive

Part Number,Application,Tool,Outer Dimension,Inner Dimention,Height (Including Adhesives)