Synthetic Quartz Photomask Substrate KNFS6025

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“KNFS6025 ” for ArF High-NA and Immersion Lithography

Links to Technical Data Sheets

Synthetic Quartz Photomask Substrate KNFS6025 (5.56MB)

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Product Description

Material Properties

Property Value
Laser source ArF
Wavelength 193.4nm
Specific Gravity 2.8
Thermal Conductivity(W/m °K) 3.0