Deep UV Photoresists

Shin-Etsu is constantly adding to our Photoresist product line; please open the Deep UV Road Map (PDF 115KB) to examine where we are going.

Shin-Etsu MicroSi’s SAIL–G series provides:

High resolution Performance

Etching Resistant

Thermal Flow Available

DUV Specialty Applications

Shin-Etsu MicroSi offers thick and thin 248nm excimer DUV resist for specialty applications. These deep UV resists are formulated for super high resolution with very high aspect ratios.

SEPR I051

Shin-Etsu MicroSi’s SEPR I501 DUV resist is formulated for extremely high resolution, straight side wall profiles with printing capability of less than 250 nm isolated trenches and semi-dense lines in 4µm thick film DUV photoresist. This DUV photoresist is widely used in TFH industries for NiFe and Cu substrates.

SEPR I803

Shin-Etsu Microsi’s SEPR I801/I803 DUV resist is formulated for extremely high resolution, with printing capability of less than 65 nm isolated lines and dense lines in 300 nm thin film DUV photoresist.  This UV photoresist is widely utilized in Semiconductor and TFH Reader applications that require the highly complex etch resistance property in the deep UV, dry etching environment.

SEPR I382 Fix Slope Angle

Shin-Etsu MicroSi’s SEPR I382 DUV resist is formulated fixed sloped angle resist with extremely high resolution below 200nm trench width. This DUV photoresist is utilized in TFH applications that require the highly complex fix sloped profile for precise micro-electroplating environment.