Photomask blanks are the base material of a reticle that is used as the patterning templates of circuits during the semiconductor lithography process. The light-shielding layer is formed on the surface of mask blank whose substrate is synthetic quartz.
Instead of Chromium (Cr) used for conventional light-shielding layer of photomask blanks, Shin-Etsu Chemical has developed the new manufacturing processes to use cutting-edge Molybdenum-Silicon Binary (OMOG: Opaque MoSi on Glass) for a light-shielding, mask blank layer. Shin-Etsu Chemical has established the mass-production technology of such most advanced photomask blanks with its superior etching characteristics. Shin-Etsu Chemical’s mask blank highly evaluated by device makers as an essential material for cutting-edge semiconductor manufacturing processes.
In addition, Shin-Etsu Chemical supplies attenuated phase-shift photomask blanks for ArF and KrF, which respond to customers’ needs.
To obtain information about Shin-Etsu Chemical’s Photomask Blanks please contact us at: email@example.com or (888) 642.7674.