Drawing upon the technological expertise we developed in the design and manufacture of various electronic materials, Shin-Etsu Chemical offers extremely high quality pellicles for pellicle photomask protection.

Recently Shin-Etsu Chemical has developed a pellicle material in polymer coated frames for the ion control and A2 membrane for the immersion ArF lithography. Shin-Etsu Chemical offers three general pellicle material grades; they are designed for KRF, dry ARF and immersion ARF excimer laser lithography.