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VIOSIL-SX

ShinEtsu’s VIOSIL Quartz Glass products have many advantageous characteristics as described below. Applications include photomask substrates in the semiconductor industry, poly-Si-TFT substrates for LCDs, micro lens substrates for LCDs and fiber optics, substrates for high frequency (RF) applications, microfluidic substrates, Nano-Imprint Templates, and DNA chip substrates. VIOSIL-SQ is made of a standard grade material, while VIOSIL-SX is made of a material with higher heat resistance.

For High Temperature Application

Description

  • Purity: high purity completely eliminates contamination.
  • Chemical resistance: high stability against a variety of solvents.
  • Heat resistance: high dimensional stability over a wide temperature range.
  • Transparency: high transmissivity over a wide range of wavelengths from UV to IR.
  • Fluorescence: no fluorescence over a wide range of wavelengths from UV to IR.
  • Dielectric properties: low dielectric loss even at GHz frequencies.
  • Surface: high flatness, high uniformity of thickness and smooth surface, thanks to techniques developed for photomask substrates used in LSI manufacturing.

Product Documents

Technical Data Sheet

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